以下部分引用 AI 总结，现阶段 AI 仍然有幻觉。请以内容的原文为准。
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SMEE
9 atoms · 跨 2 天 · 首见 2026-05-09 · 最近 2026-05-30
三色: 🟦 fact 8 · 🟥 take 1 · stance ▲1/▼1/◆2
来源: X 9
时态: fresh:8 · expired:1
标签: 好数字:8 · 好观点:1 · 好思考:1
叙事 (narrative) (1)
- 2026-05-30 · immersion tool is equivalent to ASML discontinued model NXT:1965Di
SMEE is trying to make a scanner that was discontinued by ASML 15 years ago.
tags: 好观点·好思考 · → daily
预测 (forecast) (1)
展开 1 条老旧 / 已过期
- 2026-05-09
[已过期] · 2026年Q2 出货计划
Plans to deliver 5-8 units in Q2 2026.
tags: 好数字 · → daily
value: qty=5-8 units · date=Q2 2026
事实 (fact) (7)
- 2026-05-09 · SSA800 ArFi litho tool 进入量产
SMEE SSA800 ArFi litho tool has finally entered mass production.
tags: 好数字 · → daily
- 2026-05-09 · SSA800 单次曝光工艺节点支持
supports the 28nm process in a single exposure
tags: 好数字 · → daily
- 2026-05-09 · SSA800 多次曝光工艺节点能力
can stably achieve 14nm and even more advanced process production through multiple exposure processes.
tags: 好数字 · → daily
- 2026-05-09 · SSA800 套刻精度
The overlay accuracy of the equipment is controlled at ±2.3~2.5nm
tags: 好数字 · → daily
- 2026-05-09 · SSA800 量产良率
the mass production yield is stable in the range of 90%~95%
tags: 好数字 · → daily
- 2026-05-09 · SSA800 每小时处理晶圆数
it can process 150 wafers per hour
tags: 好数字 · → daily
- 2026-05-09 · 核心子系统自研
all three core subsystems have achieved domestic self-development and self-production.
tags: 好数字 · → daily
时间轴 (近 20)
- 2026-05-30 ·
narrative · immersion tool is equivalent to ASML discontinued model NXT: · → daily
- 2026-05-09 ·
fact · SSA800 ArFi litho tool 进入量产 · → daily
- 2026-05-09 ·
forecast · 2026年Q2 出货计划 · → daily
- 2026-05-09 ·
fact · SSA800 单次曝光工艺节点支持 · → daily
- 2026-05-09 ·
fact · SSA800 多次曝光工艺节点能力 · → daily
- 2026-05-09 ·
fact · SSA800 套刻精度 · → daily
- 2026-05-09 ·
fact · SSA800 量产良率 · → daily
- 2026-05-09 ·
fact · SSA800 每小时处理晶圆数 · → daily
- 2026-05-09 ·
fact · 核心子系统自研 · → daily
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